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Upgrade of the Aberration-Corrected Low Energy Electron Microscope

LEEM-LabFig. 1: LEEM laboratory in April 2014

UV-LampFig. 2: VUV 5k He lamp installed 2013

In October 2010 the Aberration Corrected Low Energy Electron Microscope (AC-LEEM) was installed in the labs of the Peter Grünberg Institut 3. Now, in 2013, it has been upgraded to enable and optimize the Photo Electron Emission Microscopy (PEEM) technique. The commercial instrument by Elmitec GmbH (Clausthal-Zellerfeld, Germany) is still one of only a handful aberration corrected LEEMs in the world. It reaches a world-record spatial resolution of 2 nm in AC-LEEM mode. Now it was upgraded by a high-flux ultra-violet light source (Scienta VUV5k) which enables angular resolved UV photoemission spectroscopy (ARUPS) measurements with high spatial resolution. The microscope has the potential to boost many of our ongoing research projects, e.g. regarding the growth of organic thin films on metal substrates, since it enables in situ investigations in real-time.

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Contact: C. Kumpf (Structure Determination of Interfaces and Nanoscale Systems)


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