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Process Technology

Research Group Process Technology

The group process technology investigates and optimizes the deposition of amorphous and microcrystalline silicon thin-film solar cells. The activities focus on industrial relevant topics which include the upscaling of the deposition processes from lab status (10 x 10 cm2) up to industry modules (> 1 m2) and various diagnostic methods for process control application. An interdisciplinary team works on a variety of scientific and technological aspects like the understanding of the silicon growth, the analysis of influences of contaminations during the deposition or the improvement of the process stability.
The plasma enhanced chemical vapour deposition (PECVD) technique is the most relevant tool in the technology group. Various machines are used to deposit and to study different types of thin-film solar cells (e.g. pure amorphous cells or tandem cells based on amorphous and microcrystalline silicon). Using several spectroscopy tools installed at the PECVD-reactors, plasma studies and in-situ material characterization are carried out.
The dialog between the scientific and the industrial world is an important factor of the technology group. Due to the exchange of expert knowledge and novel findings, commercially used processes can be understood in more detail and subsequently improved.

Modul 30x30

PECVD-Anlage für dynamische Deposition auf 40x40 cm² Substratgröße