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Sino-German Workshop, Shanghai, October 26-27


4-th Sino-German WorkshopParticitpants of the 4-th Sino-German Workshop in Shanghai

The 4th Sino-German Workshop on Cooperation between Shanghai Institute of Microsystem and Information Technology (SIMIT) and Forschungszentrum Jülich was held in Shanghai. More than 40 participants from SIMIT, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Shanghai Advanced Research Institute (SARI), Shanghai Institute Of Applied Physics (SINAP) and Forschungszentrum Jülich (FZJ) attended the workshop with an emphasis on bioelectronics and related materials. A special focus was laid on Graphene for bioelectronics, a topic which will be in future funded in the frame of a Helmholtz-CAS Joint Research Group (HCJRG).


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