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Peter Grünberg Institute / Institute of Complex Systems

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Experimental Techniques

The activity Electronic Sensors is based on a large variety of experimental techniques for the preparation, characterization and processing of thin films and sensor test structures.

This includes among others the following techniques:

Experimental techniques

Deposition techniques

Various PVD technologies are available in the institute. Our focus lies on the sputter deposition of oxides. Major aspects are: (i) optimization of heteroepitaxial growth among others via the use of activated oxygen, (ii) engineering of structural and electronic properties of oxide films via strain and stoichiometry,   (iii) development of CMOS and bio compatible oxide films with extraordinary properties like high permittivity. The deposition is accompanied by a number of characterization methods like Rutherford backscattering, high-resolution XRD and cryoelectronic analysis.

Cryogenic Break Junction

Cryogenic experiments

Cryogelectronic characterization of thin film devices range from measurements in extremely small to large magnetic fields, temperature dependent capacitive, microwave or break junction experiments to automized measurements of the critical parameters of superconducting films are present.

Microwave techniques

Microwave techniques

Various microwave experiments on resonator and broad-band stripline concepts are available. Room temperature and cryogenic experiments provide inside in microwave properties of liquids, chemical solutions or biological objects.

Cell compatibility tests

Surface potential analysis and cell tests

The modification and analysis of the surface of electronic devices is vital for the optimization (compatibility, electronic signal transfer) of the interface between the devices and biological objects. A number of setups are available ranging from zeta-potential measurements, annealing and etching methods to cell compatibility tests.

Additional Information


Prof. Dr. Roger Wördenweber

Tel.:  +49-2461-61-2365

References and Overviews:


Wördenweber, R. , Ferroelectric Thin Layers , Bhattacharya P, Fornari R, and Kamimura H, (eds.), comprehensive Semiconductor Science and Technology, volume 4, Amsterdam: Elsevier, 2011,  pp. 177–205.


Wördenweber, R., Fundamentals of high-temperature superconductors, X.G. Qiu (eds.), High-temperature superconductors, Woodhead Publishing Limited, 2011, pp. 3-37


Moshchalkov, V.; Wördenweber, R.;  Lang, W. (Eds.), Nanoscience and Engineering in Superconductivity, Series: NanoScience and Technology, ISBN: 978-3-642-15136-1, Springer (2010) 395 pages


Wördenweber, R., High-TcFilms: From Natural Defects to Nanostructure Engineering of Vortex Matter, Nanoscience and Engineering in Superconductivity, Series: NanoScience and Technology, ISBN: 978-3-642-15136-1, Springer (2010)  25-80


Hollmann, E.; Wördenweber, R.,  Analysis of Defects in Epitaxial Oxide Thin Films via X-Ray Diffraction Technology, Thin Solid Films, 515 (2007) 7/8, 3530