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Equipmentliste

mit den Geräteverantwortlichen

EquipmentTool ownerBackupmax.
sample size
(mm)
AFMMüller, JürgenWambach, Klaus
Balzers_PLS_500Wingens, Hans100
Chemical_Mechanical_Polishing100
DISCO_Dicing_SawBunte, Stephany200
Dektak_150_Stylus_ProfilerMüller, JürgenWambach, Klaus100
Dektak_3030_Stylus_ProfilerMüller, JürgenSteffen, Alfred100
Digest_CR_1Brugger, Jana
Digest_CR_2Brugger, Jana
Digest_SEMNeumann, Elmar
Electron_Beam_LithographyTrellenkamp, Stefan150
Ellipsometer_2_SE800Moers, JürgenWambach, Klaus300
Ellipsometer_SE400Wambach, KlausMoers, Jürgen150
FIBNeumann, ElmarLehmann, Ralf100
Fume_Hood_CMP_LabSteffen, Alfred
GigaBatch_310Lehmann, RalfWambach, Klaus150
Ion_Beam_EtchingLehmann, Ralf100
LLS_EVOWingens, Hans200
LPCVD_100mmSteffen, Alfred100
Macroscope_Wild_M420Müller, Jürgen100
Mask_Aligner_1Müller, Jürgen

Bunte,

Stephany

150; Masken:

4in*4in oder

5in*5in

Mask_Aligner_2Müller, Jürgen

Bunte,

Stephany

150; Masken:

4in*4in oder

5in*5in

Mask_Aligner_3Wambach, KlausMüller, Jürgen

150; Masken:

4in*4in oder

5in*5in

Mask_Aligner_4Wambach, KlausMüller, Jürgen

150; Masken:

4in*4in oder

5in*5in

Nanoimprint_LithographyPrömpers, Michael100
Optical_Microscope_LEICA_INM100Wambach, KlausMüller, Jürgen200
Optical_Microscope_LEICA_INM300Wambach, KlausMüller, Jürgen200
Optical_Microscope_LeitzMüller, Jürgen200
Optical_Microscope_Reichert_JungMüller, JürgenWambach, Klaus200
Oxidation_Furnace_CLV200_Wetox1Prömpers, MichaelMüller, Jürgen100
Oxidation_Furnace_CLV200_Wetox2Prömpers, MichaelMüller, Jürgen100
Oxidation_Furnace_tempress_1Müller, JürgenStockmann, Regina100
Oxidation_Furnace_tempress_2Müller, JürgenStockmann, Regina100
Oxidation_Furnace_tempress_3Müller, JürgenStockmann, Regina100
PECVD_OXFORDHermanns, BerndKlaassen, Iris200
PECVD_SENTECHHermanns, BerndBanzet, Marko200
Pfeiffer_PLS_570Banzet, MarkoPrömpers, Michael100
RIE_3_Oxford_Plasmalab_100Hermanns, BerndKlaassen, Iris100
RIE_4_Oxford_Plasmalab_100Hermanns, BerndKlaassen, Iris100
RIE_5_Oxford_Plasmalab_100Hermanns, BerndKlaassen, Iris100
RIE_6_Oxford_Plasmalab_100Hermanns, BerndKlaassen, Iris100
RIE_7_Oxford_Plasmalab_100Hermanns, BerndKlaassen, Iris100
RTP_Addax_III_VMüller, Jürgen100
RTP_Addax_Si_GeMüller, Jürgen100
RTP_Steag_RRMüller, Jürgen200
SEM_FEINeumann, ElmarLehmann, Ralf100
SEM_ZeissNeumann, ElmarLehmann, Ralf100
SEM_Zeiss_CleanRoomNeumann, ElmarLehmann, Ralf100
Scriber_1Bunte, StephanyMüller, Jürgen100
Scriber_2_SiBunte, StephanyMüller, Jürgen100
WB_10_1_PreClean_1Brugger, JanaMoers, Jürgen150; 5in*5in
WB_10_2_PreClean_2Brugger, JanaMoers, Jürgen150; 5in*5in
WB_1_Mask_Technology
WB_2_1_CMOS_Litho_SolventBraun, Nadja
WB_2_2_CMOS_Litho_CoatingBraun, Nadja200
WB_2_2_CMOS_Litho_FurnaceBraun, Nadja
WB_2_3_CMOS_Litho_DevelopmBraun, Nadja
WB_3_CMOS_cleaningKlaassen, Iris
WB_4_CMOS_EtchingKlaassen, Iris
WB_5_1_III_V_Litho_SolventMikulics, MartinBraun, Nadja
WB_5_2_III_V_Litho_DevelopmentMikulics, MartinBraun, Nadja
WB_5_3_III_V_Litho_CoatingMikulics, MartinBraun, Nadja200
WB_5_3_III_V_Litho_FurnaceMikulics, MartinBraun, Nadja
WB_6_III_V_EtchingMikulics, Martin
WB_7_1_BioMEMS_Litho_CoatingPrömpers, MichaelBanzet, Marko200
WB_7_1_BioMEMS_Litho_FurnacePrömpers, MichaelBanzet, Marko
WB_7_2_BioMEMS_Litho_DevelopmPrömpers, MichaelBanzet, Marko
WB_7_3_BioMEMS_Litho_SolventPrömpers, MichaelBanzet, Marko
WB_8_1_BioMEMS_Etching_1Prömpers, MichaelBanzet, Marko
WB_8_1_BioMEMS_Etching_2Prömpers, MichaelBanzet, Marko
WB_9_1_Solvent_w_o_heatingBrugger, JanaMoers, Jürgen
WB_9_2_Solvent_with_heatingBrugger, JanaMoers, Jürgen
Wafer_cleaner_SSEC_3300_MLBrugger, JanaKlaassen, Iris300

 


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