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Patterning

Optical (UV), mechanical (NIL) and e-beam lithography

Ebeam

Electron-Beam Lithography Equipment

Electron-Beam Writer Vistec EBPG 5000plus

Mehr: Electron-Beam Lithography Equipment …

Imprinter

Nanoimprintor

Nanoimprintor Nanonex NX-2000

Mehr: Nanoimprintor …

Wet Bench Area

Wet Benches Si-Technology

Mask Making

Wet Bench Mask Making

WB_III_V

Wet Bench III-V

WB_Bioelectronics

Wet Benches Bioelectronics

WB-Precleaning

Wet Bench Precleaning

Mask Cleaner

Mask Cleaning Station APT 915

Wet chemical cleaning of masks after use (traces of resist are removed)

RIE 3_4

Oxford Plasmalab 100 Cluster Tool (RIE3)

RIE 3_4

Oxford Plasmalab 100 Cluster Tool (RIE4)

Oxford maschinen

Oxford Plasmalab 100 (RIE5)

Oxford maschinen

Oxford Plasmalab 100 (RIE6)

Oxford maschinen

Oxford Plasmalab 100 (RIE7)

Gigabatch

Barrel Reactor TePla Gigabatch 310M

Addax

UniTemp RTP-150 furnaces

STEAGRTP

Steag 2800 RTP furnace

Tempress

Oxidation furnaces

MaskAligner

Mask Aligners

Mask Aligners Süss MA-6/MA-8 365/320/248nm

Mehr: Mask Aligners …


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