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Nano-technology-based methods are gaining importance in the exploration and production of novel, highly efficient solar cells. The nano-imprint technology shown here, for example, can be used to structure glass substrates, which are used in thin film solar cells. The texture improves the light management of the solar cell. The big advantage of nano-imprint technology is that every possible structure that serves to improve the optical properties can be transferred onto a glass substrate. Thus, novel textures which have proven in optical simulations to be especially advantageous can be designed and produced in cooperation with the optics group.

In addition, the nano-imprint technology is a method that can be realized on large substrate areas and it allows high production throughput. This is essentially important for industrial implementation. The aim of the group is therefore to develop nano-technological processes, which can be realized in modern large-area production. This is done in collaborative projects with industrial partners, which have expertise in up-scaling of nano-imprint processes.



M. Meier, U. W. Paetzold, M. Prömpers, T. Merdzhanova, R. Carius, A. Gordijn, “UV nanoimprint for the replication of etched ZnO:Al textures applied in thin-film silicon solar cells”, Prog. Photovolt: Res. Appl., DOI: 10.1002/pip.2382 (2013).

U. W. Paetzold, E. Moulin, D. Michaelis, W. Böttler, C. Wächter, V. Hagemann, M. Meier, R. Carius, U. Rau, “Plasmonic reflection grating back contacts for microcrystalline silicon solar cells”, Appl. Phys. Lett. 99, 181105 (2011).

U. W. Paetzold, W. Zhang, M. Prömpers, J. Kirchhoff, T. Merdzhanova, S. Michard, R. Carius, A. Gordijn, M Meier, “Thin-film silicon solar cell development on imprint textured glass substrates”, Mat. Sci. Eng. B 178, 617-622 (2013).


Dr. Matthias Meier
Dr.-Ing. Florian Lentz