2016

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Lowering Forming Voltage and Forming-Free Behavior of Ta2O5 ReRAM Devices
IEDM2016, BostonBoston, USA, 4 Dec 2016 - 9 Dec 20162016-12-042016-12-09 BibTeX | EndNote: XML, Text | RIS

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Internal Cell Resistance as the Origin of Abrupt Reset Behavior in HfO2-Based Devices Determined from Current Compliance Series
International Memory Workshop, ParisParis, France, 15 May 2016 - 20 May 20162016-05-152016-05-20 BibTeX | EndNote: XML, Text | RIS

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Internal Cell Resistance as the Origin of Abrupt Reset Behavior in HfO2-Based Devices Determined from Current Compliance Series
2016 IEEE International Memory Workshop (IMW), ParisParis, France, 15 May 2016 - 18 May 20162016-05-152016-05-18 [10.1109/IMW.2016.7495280]  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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ReRAM performance of metal/TiOx/Al2O3/metal nano crosspoint structures with oxides grownn byy atomic layer deposition
CIMTEC 2016, PerugiaPerugia, Italy, 5 Jun 2016 - 10 Jun 20162016-06-052016-06-10 BibTeX | EndNote: XML, Text | RIS

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Analysis of the Two-Part SET Switching Process in STO-based ReRAM
Materials Research Society Fall Meeting, BostonBoston, USA, 27 Nov 2016 - 2 Dec 20162016-11-272016-12-02 BibTeX | EndNote: XML, Text | RIS

Last Modified: 18.03.2025